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Semi-Auto Single-Cavity Lithography Plate Cleaning Machine can effectively remove the photoresist residue on the surface of the photoetching plate and clean the surface of the photolithog-raphy plate through immersion, brush cleaning, ACE/IPA rinsing, and megasound cleaning.

The equipment is mainly composed of process chamber, lifting scanning swing arm module, brushing swing arm module, liquid supply and discharge system, air purification and static elimina-tion system, exhaust system, central control system, etc. The pr-ocess chamber can be equipped with brush cleaning, ACE clean-ing,IPA cleaning,mega cleaning,nitrogen purging, nitrogen blow-drying, centrifugal spin-off

and other functions.