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Wafer Spin Dryer is a critical equipment in semiconductor manu-facturing, primarily used for drying wafers after wet cleaning pr-ocesses. This equipment integrates water spray cleaning, nitrog-en purging, and quartz infrared lamp drying functions, effective-ly removing contaminants and moisture from the wafer surface to ensure residue-free drying.It is compatible with 4-inch,6-inch, 8-inch,and 12-inch wafers,catering to various wafer sizes and m-eeting the high cleanliness and efficiency requirements of semic-onductor production lines.